JPH0336268B2 - - Google Patents

Info

Publication number
JPH0336268B2
JPH0336268B2 JP59156354A JP15635484A JPH0336268B2 JP H0336268 B2 JPH0336268 B2 JP H0336268B2 JP 59156354 A JP59156354 A JP 59156354A JP 15635484 A JP15635484 A JP 15635484A JP H0336268 B2 JPH0336268 B2 JP H0336268B2
Authority
JP
Japan
Prior art keywords
electrode
arc chamber
flange
ion beam
diameter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP59156354A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6134832A (ja
Inventor
Tadashi Sato
Kokichi Oohata
Yasunori Oono
Tomoe Kurosawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP15635484A priority Critical patent/JPS6134832A/ja
Publication of JPS6134832A publication Critical patent/JPS6134832A/ja
Publication of JPH0336268B2 publication Critical patent/JPH0336268B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/022—Details

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Plasma Technology (AREA)
  • Electron Sources, Ion Sources (AREA)
JP15635484A 1984-07-26 1984-07-26 大口径イオン源 Granted JPS6134832A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15635484A JPS6134832A (ja) 1984-07-26 1984-07-26 大口径イオン源

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15635484A JPS6134832A (ja) 1984-07-26 1984-07-26 大口径イオン源

Publications (2)

Publication Number Publication Date
JPS6134832A JPS6134832A (ja) 1986-02-19
JPH0336268B2 true JPH0336268B2 (en]) 1991-05-30

Family

ID=15625919

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15635484A Granted JPS6134832A (ja) 1984-07-26 1984-07-26 大口径イオン源

Country Status (1)

Country Link
JP (1) JPS6134832A (en])

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2587629B2 (ja) * 1987-01-31 1997-03-05 東京エレクトロン 株式会社 電子ビ−ム式プラズマ装置
DE3708716C2 (de) * 1987-03-18 1993-11-04 Hans Prof Dr Rer Nat Oechsner Hochfrequenz-ionenquelle
US4835102A (en) * 1987-03-31 1989-05-30 Eugene Bell Tissue equivalent test systems
US4837379A (en) * 1988-06-02 1989-06-06 Organogenesis Inc. Fibrin-collagen tissue equivalents and methods for preparation thereof
JP3513474B2 (ja) * 2000-09-05 2004-03-31 株式会社昭和真空 大口径イオン源
US7495241B2 (en) 2004-02-26 2009-02-24 Tdk Corporation Ion beam irradiation apparatus and insulating spacer for the same
WO2008107705A1 (en) * 2007-03-02 2008-09-12 Nordiko Technical Services Limited Apparatus

Also Published As

Publication number Publication date
JPS6134832A (ja) 1986-02-19

Similar Documents

Publication Publication Date Title
US4383177A (en) Multipole implantation-isotope separation ion beam source
US4100055A (en) Target profile for sputtering apparatus
US5215703A (en) High-flux neutron generator tube
US4060470A (en) Sputtering apparatus and method
US3315125A (en) High-power ion and electron sources in cascade arrangement
JPS6039159A (ja) 陰極スパツタリング装置のためのマグネトロン陰極
US4661710A (en) Negative ion source
JPH0336268B2 (en])
US4847476A (en) Ion source device
US2934665A (en) Ion source
Dimov et al. A 100 mA negative hydrogen-ion source for accelerators
GB1101293A (en) High output duoplasmatron-type ion source
US3996464A (en) Mass spectrometer with magnetic pole pieces providing the magnetic fields for both the magnetic sector and an ion-type vacuum pump
JPH0213900A (ja) 密封高ビーム束中性子管
US6259102B1 (en) Direct current gas-discharge ion-beam source with quadrupole magnetic separating system
Okumura et al. Cesium mixing in the multi‐ampere volume H− ion source
US3869675A (en) Heating arrangement with focused electron beams under vacuum
JP2860073B2 (ja) 負イオン源装置
JPH02239559A (ja) イオン源
US3527937A (en) Electron bombardment type ion source for a mass spectrometer
GB829783A (en) Apparatus for producing beams of ions of a given element
JP3116794B2 (ja) 高周波イオン源
CN113357110B (zh) 降低微型离子电推力器中原初电子损耗的方法及结构
JPH06128733A (ja) イオンビーム装置
JPH024979B2 (en])

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees